Silicon AnalyticaGlossary · Lithography
What is High-NA EUV?
High-NA EUV is the next generation of EUV lithography. It uses optics with a larger numerical aperture (0.55 instead of 0.33) so that smaller features can be printed in a single exposure.
Why it matters for investors
High-NA systems are intended for future logic and memory nodes, where they may reduce the need for multiple patterning steps. Each chipmaker decides when the cost and maturity of the tools justify switching, so adoption timing differs between companies.
For ASML, the transition affects product mix and margins over several years. Investors follow which customers have taken delivery of the tools and when they plan to use them in volume production.
Key companies
Related terms
General educational explanation. Information only, not investment advice.